DocumentCode :
1267719
Title :
Micromachining of Pyrex 7740 Glass by Silicon Molding and Vacuum Anodic Bonding
Author :
Liu, Junwen ; Shang, Jintang ; Tang, Jieying ; Huang, Qing-An
Author_Institution :
Key Lab. of MEMS of the Minist. of Educ., Southeast Univ., Nanjing, China
Volume :
20
Issue :
4
fYear :
2011
Firstpage :
909
Lastpage :
915
Abstract :
A wafer-level processing technology that is used to precisely fabricate regular arrays of deep cavities in a Pyrex 7740 glass wafer is presented by silicon molding and vacuum anodic bonding. The fabrication process is based on etching cavities in silicon, followed by vacuum anodic bonding of a glass wafer to the etched silicon wafer. The bonded wafers are then heated inside a furnace at a temperature above the softening point of the glass, and the glass is shaped into cavities. The processing parameters are obtained by a series of experiments. The array of square glass cavities with 10-μm side length is accurately fabricated. Finally, a wafer-level hermetic packaging process is demonstrated after the second anodic bonding process. A diced single chip has been tested for leakage rate and bonding strength, which shows that the presented fabrication process is appropriate for the wafer-level packaging of MEMS devices.
Keywords :
bonding processes; etching; glass; heat treatment; micromachining; micromechanical devices; moulding; wafer level packaging; MEMS devices; Pyrex 7740 glass wafer; bonding strength; diced single chip; etching; furnace heating; leakage rate; micromachining; silicon molding; softening point; vacuum anodic bonding; wafer-level hermetic packaging; Bonding; Cavity resonators; Glass; Heat treatment; Silicon; Viscosity; Anodic bonding; glass; micromachining; wafer-level packaging;
fLanguage :
English
Journal_Title :
Microelectromechanical Systems, Journal of
Publisher :
ieee
ISSN :
1057-7157
Type :
jour
DOI :
10.1109/JMEMS.2011.2160043
Filename :
5948316
Link To Document :
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