Shaped patterns from a continuous planar aperture distribution

A pattern synthesis procedure is developed for a planar aperture with a circular boundary. A phi -symmetric continuous distribution is assumed and required to produce a flat-topped beam with controlled ripple, surrounded by ring side lobes of controlled height. With M filled-in s in the shaped region, there are 2^M solutions for the aperture distribution. Sampling can yield the excitation of a circular grid planar array. Linear stretching extends the results of an elliptical boundary.