DocumentCode :
1268814
Title :
Self-Heating and Kink Effects in SLS Single-Crystal-Like Nanowire Transistors
Author :
Kang, Tsung-Kuei ; Liao, Ta-Chuan ; Yang, Ysung-Yu
Author_Institution :
Dept. of Electron. Eng., Feng Chia Univ., Taichung, Taiwan
Volume :
59
Issue :
10
fYear :
2012
Firstpage :
2787
Lastpage :
2794
Abstract :
In this paper, the electrical characteristics of sequential-lateral-solidification (SLS) single-crystal-like nanowire (NW) poly-Si thin-film transistors (TFTs) with various gate structures are compared and comprehensively studied. The self-heating and kink effects of all SLS TFT devices with various gate structures are analyzed. Owing to the nanoscale nitride hard mask, each NW is easily transformed within one crystalline grain of the SLS poly-Si film with the regularly arranged grains; thus, each NW performs with a single-crystal-like device channel. Therefore, NW-type SLS TFTs with gate-all-around (GAA) and trigated (TRI) structures exhibit better electrical characteristics as compared with the conventional planar SLS TFTs. At moderate VGS and VDS biases, GAA devices exhibit better electrical characteristics. However, the self-heating effect and the local electric fields located at three sharp corners result in the severe degradation of electrical characteristics for GAA-SLS TFTs operated or stressed at high VGS and VDS biases.
Keywords :
electric fields; elemental semiconductors; masks; nanowires; silicon; thin film transistors; GAA device; NW; SLS single-crystal-like nanowire poly-Si thin-film transistor; Si; TFT; TRI structure; crystalline grain; electric field; gate structure; gate-all-around device; kink effect; nanoscale nitride hard mask; planar SLS TFT; self-heating effect; sequential-lateral-solidification; trigated structure; Electric variables; Etching; Logic gates; Nanoscale devices; Performance evaluation; Silicon; Thin film transistors; Gate all around (GAA); kink effect; nanowire (NW); self-heating; sequential lateral solidification (SLS); single-crystalline-like; trigated (TRI);
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2012.2210045
Filename :
6276245
Link To Document :
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