DocumentCode :
1272394
Title :
Lateral Si avalanche photodiode fabricated over an etched interdigital mesa
Author :
Choi, Y.-I. ; Chung, Shih-Kai
Volume :
26
Issue :
23
fYear :
1990
Firstpage :
1946
Lastpage :
1947
Abstract :
A lateral Si avalanche photodiode suitable for monolithic integrated circuits is fabricated over an etched interdigital mesa. The lateral structure ensures pure electron injection exhibiting no wavelength dependence of the multiplication and the multiplication noise. Substantial enhancement in the quantum efficiency at short wavelengths was observed.
Keywords :
avalanche photodiodes; elemental semiconductors; etching; integrated optoelectronics; silicon; etched interdigital mesa; lateral Si avalanche photodiode; monolithic integrated circuits; multiplication noise; pure electron injection; quantum efficiency; short wavelengths;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19901259
Filename :
59538
Link To Document :
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