DocumentCode
1272857
Title
Broad optical bandwidth InGaAs-InAlGaAs light-emitting diodes fabricated using a laser annealing process
Author
McDougall, S.D. ; Kowalski, O.P. ; Marsh, J.H. ; Aitchison, J.S.
Author_Institution
Dept. of Electron. & Electr. Eng., Glasgow Univ., UK
Volume
11
Issue
12
fYear
1999
Firstpage
1557
Lastpage
1559
Abstract
The use of a laser-induced quantum-well intermixing technique in the InGaAs-InAlGaAs material system is presented. We report blue shifts of up to 240 nm in the 1.55-μm emission wavelength, generated by exposure to a Nd:YAG laser. Variations in the optical intensity across the irradiating beam were used to laterally grade the bandgap along a sample. We used this technique to fabricate broad optical bandwidth, light-emitting diodes. The devices showed an increase in the full width half maximum of the emission spectrum from 125 nm in undisordered devices to over 260 nm in intermixed material. The output spectrum was also observed to be flat-topped (within 5%) across a wavelength range of 140 nm.
Keywords
III-V semiconductors; aluminium compounds; gallium arsenide; indium compounds; laser beam annealing; light emitting diodes; molecular beam epitaxial growth; optical fabrication; 1.55 mum; 1.55-/spl mu/m emission wavelength; InGaAs-InAlGaAs; InGaAs-InAlGaAs light-emitting diodes; InGaAs-InAlGaAs material system; LED fabrication; Nd:YAG laser; YAG:Nd; YAl5O12:Nd; bandgap; blue shifts; broad optical bandwidth; emission spectrum; flat-topped; full width half maximum; intermixed material; irradiating beam; laser annealing process; laser-induced quantum-well intermixing techniqu; laterally grade; optical intensity; output spectrum; undisordered devices; Annealing; Bandwidth; Light emitting diodes; Optical interferometry; Optical materials; Optical sensors; Optical waveguides; Photonic band gap; Quantum well lasers; Stimulated emission;
fLanguage
English
Journal_Title
Photonics Technology Letters, IEEE
Publisher
ieee
ISSN
1041-1135
Type
jour
DOI
10.1109/68.806845
Filename
806845
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