DocumentCode :
1273068
Title :
Resonant-cavity-enhanced high-speed Si photodiode grown by epitaxial lateral overgrowth
Author :
Schaub, J.D. ; Li, R. ; Schow, C.L. ; Campbell, J.C. ; Neudeck, G.W. ; Denton, J.
Author_Institution :
Texas Univ., Austin, TX, USA
Volume :
11
Issue :
12
fYear :
1999
Firstpage :
1647
Lastpage :
1649
Abstract :
We report a resonant cavity Si photodiode grown by merged epitaxial lateral overgrowth. At a reverse bias of 5 V, the dark current was 2.7 pA and the bandwidth exceeded 34 GHz. The peak quantum efficiencies ranged from 42% at 704 nm to 31% at 836 nm. This is the highest speed reported for a Si p-i-n photodiode and the highest bandwidth-efficiency product for any Si-based photodetector.
Keywords :
dark conductivity; epitaxial growth; high-speed optical techniques; optical fabrication; optical resonators; photodetectors; photodiodes; semiconductor growth; silicon; 2.7 pA; 42 to 31 percent; 5 V; 704 to 836 nm; Si; Si p-i-n photodiode; Si-based photodetector; dark current; epitaxial lateral overgrowth; highest bandwidth-efficiency product; merged epitaxial lateral overgrowth; peak quantum efficiencies; resonant cavity Si photodiode; resonant-cavity-enhanced high-speed Si photodiode; reverse bias; Bandwidth; Detectors; Electromagnetic wave absorption; Mirrors; Molecular beam epitaxial growth; PIN photodiodes; Photodetectors; Resonance; Silicon; Voltage;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/68.806875
Filename :
806875
Link To Document :
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