DocumentCode :
1273165
Title :
High-Holding-Voltage Silicon-Controlled Rectifier for ESD Applications
Author :
Dong, Shurong ; Wu, Jian ; Miao, Meng ; Zeng, Jie ; Han, Yan ; Liou, Juin J.
Author_Institution :
Dept. of Inf. Sci. & Electron. Eng., Zhejiang Univ., Hangzhou, China
Volume :
33
Issue :
10
fYear :
2012
Firstpage :
1345
Lastpage :
1347
Abstract :
Low-voltage-triggering silicon-controlled rectifier (LVTSCR) having a gate structure can offer a low trigger voltage in electrostatic discharge (ESD) applications. To avoid the threat of latch-up, the lateral width of LVTSCR is often stretched to obtain a relatively high holding voltage. The resulting lateral dimension increase, however, enlarges the size of LVTSCR. In this letter, a new method to increase the holding voltage of LVTSCR is developed. It is based on adding a floating-n-well region in the LVTSCR and can increase the holding voltage without requiring additional layout area. Furthermore, with this new LVTSCR, it is possible to implement an ESD protection operation within a very small window of 1 V.
Keywords :
electrostatic discharge; thyristors; ESD protection operation; LVTSCR; electrostatic discharge applications; floating-n-well region; gate structure; high-holding-voltage silicon-controlled rectifier; lateral dimension; lateral width; low-voltage-triggering silicon-controlled rectifier; voltage 1 V; Bipolar transistors; CMOS integrated circuits; CMOS process; Electrostatic discharges; Logic gates; Thyristors; Electrostatic discharge (ESD); floating n-well (FN); silicon-controlled rectifier (SCR);
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2012.2208934
Filename :
6286984
Link To Document :
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