• DocumentCode
    1274122
  • Title

    AlGaN/GaN HBTs using regrown emitter

  • Author

    Limb, J.B. ; McCarthy, L. ; Kozodoy, P. ; Xing, H. ; Ibbetson, J. ; Smorchkova, Y. ; DenBaars, S.P. ; Mishra, U.K.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., California Univ., Santa Barbara, CA, USA
  • Volume
    35
  • Issue
    19
  • fYear
    1999
  • fDate
    9/16/1999 12:00:00 AM
  • Firstpage
    1671
  • Lastpage
    1673
  • Abstract
    AlGaN/GaN HBTs using regrown emitter AlGaN/GaN HBTs have been realised using the regrown emitter method. The device structure consists of an n-GaN collector, p-GaN base, and selectively grown AlGaN emitter. The HBTs were grown using metal organic chemical vapour deposition on sapphire substrate. The emitter was grown selectively on a pn junction diode after it was patterned with SiN. A common emitter curve showing low-leakage has been obtained
  • Keywords
    III-V semiconductors; MOCVD; aluminium compounds; gallium compounds; heterojunction bipolar transistors; leakage currents; semiconductor device measurement; semiconductor growth; wide band gap semiconductors; AlGaN-GaN; AlGaN/GaN HBTs; SiN; SiN patterning; common emitter curve; low-leakage; metal organic chemical vapour deposition; n-GaN collector; p-GaN base; pn junction diode; regrown emitter method; sapphire substrate; selectively grown AlGaN emitter;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19991129
  • Filename
    807063