DocumentCode :
1274145
Title :
Low transparent Pt ohmic contact on p-type GaN by surface treatment using aqua regia
Author :
Kim, Jong Kyu ; Lee, Jong-Lam ; Lee, Jae Won ; Park, Yong Jo ; Taeil Kim
Author_Institution :
Dept. of Mater. Sci. & Eng., Pohang Inst. of Sci. & Technol., South Korea
Volume :
35
Issue :
19
fYear :
1999
fDate :
9/16/1999 12:00:00 AM
Firstpage :
1676
Lastpage :
1678
Abstract :
A low transparent ohmic contact on p-type GaN has been achieved through the deposition of Pt on p-type GaN treated using boiling aqua regia. The contact resistivity was decreased from 4.7×10-1 to 1.4×10-4 Ωcm2 by the surface treatment. The drastic reduction in contact resistivity originates from both the removal of surface oxides by the boiling aqua regia and the high work function of Pt. The surface treatment plays a role in reducing the barrier height for holes at the Pt/p-type GaN interface, leading to good ohmic contacts on p-type GaN
Keywords :
III-V semiconductors; contact resistance; gallium compounds; ohmic contacts; platinum; semiconductor-metal boundaries; surface treatment; transparency; wide band gap semiconductors; work function; GaN; I-V characteristics; Pt-GaN; Pt/GaN low transparent ohmic contact; XPS; aqua regia; boiling aqua regia; contact resistivity; hole barrier height; surface oxide removal; surface treatment; work function;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19991099
Filename :
807066
Link To Document :
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