DocumentCode
1275129
Title
Simulation for 3-D optical and electrical analysis of CCD
Author
Mutoh, Hideki
Author_Institution
Link Res. Corp., Tokyo, Japan
Volume
44
Issue
10
fYear
1997
fDate
10/1/1997 12:00:00 AM
Firstpage
1604
Lastpage
1610
Abstract
A device simulator, SPECTRA, and an optics simulator, TOCCATA, were developed for three-dimensional (3-D) optical and electrical analysis of a charge-coupled device (CCD). SPECTRA solves Poisson´s and time dependent current continuity equations by a novel Gummel´s method. Since the basic parameters are potential and exponential functions of the quasi-Fermi level of electrons and holes, the solution can be obtained in a stable and rapid way compared to the conventional method. TOCCATA calculates the shape of layers, which consist of silicon-oxide, silicon-nitride, poly-silicon, light shield metal, micro-lens material, etc., formed on a silicon substrate and performs ray tracing on multiple reflection, refraction, and absorption or executes wave analysis which involves interference and diffraction. The combination of these simulators realizes the optical and electrical analysis for the total design of CCD cell structures on and in a silicon substrate. It is reported that the simulation method successfully analyzes the optical and electrical characteristics of interline-transfer charge-coupled devices (IT-CCD)
Keywords
CCD image sensors; Fermi level; electronic engineering computing; integrated circuit design; integrated circuit modelling; light absorption; light diffraction; light interference; light reflection; light refraction; ray tracing; 3-D optical analysis; CCD; CCD cell structures; CCD image sensor; Gummel method; Poisson equation; SPECTRA; Si; Si substrate; Si3N4; SiO2; TOCCATA; absorption; device simulator; diffraction; electrical analysis; electrons; exponential functions; holes; interference; interline-transfer charge-coupled devices; light shield metal; micro-lens material; multiple reflection; optics simulator; poly-silicon; potential functions; quasi-Fermi level; ray tracing; refraction; three-dimensional analysis; time dependent current continuity equations; wave analysis; Analytical models; Charge carrier processes; Charge coupled devices; Electron optics; Inorganic materials; Optical devices; Optical refraction; Poisson equations; Shape; Silicon;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.628811
Filename
628811
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