DocumentCode
1276702
Title
Strong self-focusing of a 7.2 MeV electron beam striking an aluminized mylar target
Author
Vermare, C. ; Labrouche, J. ; De Gabory, P. Le Taillandier ; Villate, D. ; Donohue, J.T.
Author_Institution
CEA, Centre d´´Etudes Sci. et Tech. d´´Aquitaine, Le Barp, France
Volume
27
Issue
6
fYear
1999
fDate
12/1/1999 12:00:00 AM
Firstpage
1566
Lastpage
1571
Abstract
A substantial reduction in the spot size of a 7.2 MeV, 3 kA electron beam illuminating a thin aluminized mylar target has been observed during a 60 ns pulse. We attribute this to the emission of positive ions from the target, under the influence of the high energy flux of the beam, which perforates the target, These ions are then accelerated upstream and focused along the axis by the electron beam, where they partially neutralize the space-charge of the beam and produce a sharp pinch. After the pinch, the beam expands and forms filaments at the end of the pulse. By varying the initial beam transverse size, we have studied the influence of the beam density on the effect. A simulation of the effect with a particle-in-cell code provides a qualitative description and suggests that the ions responsible for the effect are Al+ and O+
Keywords
aluminium; electron beam focusing; electron-surface impact; polymer films; self-focusing; space charge; 3 kA; 60 ns; 7.2 MeV; Al; O; electron beam illumination; high energy flux; induction machine; ion acceleration; ion beam focusing; particle beam diagnostics; particle beam measurement; secondary ion emission; space-charge partial neutralisation; spot size; strong self-focusing; target perforation; thin aluminized mylar target; upstream acceleration; Acceleration; Electron beams; Induction generators; Induction machines; Ion accelerators; Ion emission; Particle accelerators; Particle beam measurements; Particle beam optics; Particle beams;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.808927
Filename
808927
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