• DocumentCode
    1278311
  • Title

    Highly stable hydrogenated amorphous silicon germanium solar cells

  • Author

    Gordijn, Aad ; Zambrano, Raùl Jimenez ; Rath, Jatindra Kumar ; Schropp, Ruud E.I.

  • Author_Institution
    Debye Res. Inst., Utrecht Univ., Netherlands
  • Volume
    49
  • Issue
    5
  • fYear
    2002
  • fDate
    5/1/2002 12:00:00 AM
  • Firstpage
    949
  • Lastpage
    952
  • Abstract
    This article shows an optimized a-SiGe:H material that behaves highly stable in solar cells. The a-SiGe:H material is deposited by PECVD with high hydrogen dilution, near the microcrystalline deposition regime. We made various a-SiGe:H single solar cells to optimize the device design. The band gap in the central part of the cell is 1.53 eV. The hydrogen bonding configuration in the a-SiGe:H material suggests the presence of voids, however, the material has no noticeable sign of crystallinity. Light soaking experiments showed that the present single junction a-SiGe:H solar cells are highly stable. After one hour of light soaking, a slight improvement in fill factor is observed and an improvement in carrier collection in the red region is evident from spectral response. The stable a-SiGe:H material is incorporated as the bottom cell of a-Si:H/a-SiGe:H tandem solar cells. Unlike the single junction cell, this tandem cell slightly degrades under light soaking. This is solely the result of degradation of the a-Si:H top layer
  • Keywords
    Ge-Si alloys; Staebler-Wronski effect; amorphous semiconductors; energy gap; hydrogen; plasma CVD coatings; solar cells; PECVD growth; Si:H-SiGe:H; SiGe:H; a-Si:H/a-SiGe:H tandem solar cell; a-SiGe:H single junction solar cell; band gap; carrier collection; fill factor; hydrogenated amorphous silicon germanium solar cell; light soaking; spectral response; stability; Amorphous silicon; Bonding; Crystalline materials; Crystallization; Degradation; Design optimization; Germanium; Hydrogen; Photonic band gap; Photovoltaic cells;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.998611
  • Filename
    998611