Title :
The importance of bandgap narrowing distribution between the conduction and valence bands in abrupt HBTs
Author :
López-González, Juan M. ; Prat, Lluís
Author_Institution :
Univ. Politecnica de Catalunya, Barcelona, Spain
fDate :
7/1/1997 12:00:00 AM
Abstract :
Abrupt heterojunction bipolar transistors (HBTs) show interfaces where discontinuities in the energy levels appear. Currents through these interfaces are controlled by tunneling and thermionic emission. The values of these currents depend on the form and height of the energy barriers, which are disturbed by the heavy doping effects on semiconductor energy band structure. In this work, the real bandgap narrowing is distributed between the conduction and valence bands according to Jain-Roulston model, and its effect on the base and collector currents of Si/SiGe and InP/InGaAs HBTs is analyzed. This analysis is carried out through a numerical model which combines the drift-diffusion transport in the bulk of transistor with the thermionic emission and tunneling at the base-emitter interface, and an empirically determined surface recombination current
Keywords :
energy gap; heterojunction bipolar transistors; semiconductor device models; surface recombination; thermionic electron emission; tunnelling; InP-InGaAs; Jain-Roulston model; Si-SiGe; abrupt HBT; bandgap narrowing distribution; base current; base-emitter interface; collector current; conduction band; drift-diffusion transport; energy barrier; energy level discontinuity; heavy doping; heterojunction bipolar transistor; numerical model; semiconductor energy band structure; surface recombination current; thermionic emission; tunneling; valence band; Energy barrier; Energy states; Germanium silicon alloys; Heterojunction bipolar transistors; Photonic band gap; Semiconductor device doping; Semiconductor process modeling; Silicon germanium; Thermionic emission; Tunneling;
Journal_Title :
Electron Devices, IEEE Transactions on