DocumentCode :
1279090
Title :
InGaAs/InP thermoelectric infrared sensor utilizing surface bulk micromachining technology
Author :
Dehé, Alfons ; Pavlidis, Dimitris ; Hong, Kyushik ; Hartnagel, Hans L.
Author_Institution :
Tech. Univ. Darmstadt, Germany
Volume :
44
Issue :
7
fYear :
1997
fDate :
7/1/1997 12:00:00 AM
Firstpage :
1052
Lastpage :
1059
Abstract :
A novel InGaAs/InP micromachined thermoelectric sensor is presented. The key features of the reported sensors are the high thermal resistivity and high mobility of InGaAs lattice matched to InP, combined with a value of Seebeck coefficient that is acceptable for such applications. The anisotropic and selective surface bulk micromachining properties of this material system were successfully applied to devices aligned along the (010) orientation on a [100] InP wafer and the details of the technology used for this purpose are presented. A responsivity of 184 V/W and a relative detectivity of 7.1×108 cm Hz-1/2/W have been demonstrated using this new sensor approach
Keywords :
III-V semiconductors; Seebeck effect; gallium arsenide; indium compounds; infrared detectors; micromachining; microsensors; thermoelectric devices; InGaAs-InP; Seebeck coefficient; detectivity; lattice matched system; mobility; responsivity; surface bulk micromachining technology; thermal resistivity; thermoelectric infrared sensor; Anisotropic magnetoresistance; Conductivity; Indium gallium arsenide; Indium phosphide; Infrared sensors; Lattices; Sensor phenomena and characterization; Thermal resistance; Thermal sensors; Thermoelectricity;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.595931
Filename :
595931
Link To Document :
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