• DocumentCode
    1279690
  • Title

    Low frequency and 1/f noise in wide-gap semiconductors: silicon carbide and gallium nitride

  • Author

    Levinshtein, M.E. ; Rumyantsev, S.L. ; Shur, M.S. ; Gaska, R. ; Khan, M.A.

  • Author_Institution
    A.F. Ioffe Physicotech. Inst., Acad. of Sci., St. Petersburg, Russia
  • Volume
    149
  • Issue
    1
  • fYear
    2002
  • fDate
    2/1/2002 12:00:00 AM
  • Firstpage
    32
  • Lastpage
    39
  • Abstract
    The results of experimental and theoretical studies of low-frequency noise in wide-bandgap semiconductors and wide-band-gap semiconductor devices are reviewed. The unusual features of the low-frequency noise in these systems include an extremely low level of noise in SiC and SiC-based devices and a large difference in the noise level in GaN-based films and GaN-based field effect transistors (FETs) (with the noise being much smaller in GaN-based FETs). The authors also report on the generation recombination noise in SiC and GaN-based materials and devices
  • Keywords
    1/f noise; III-V semiconductors; gallium compounds; junction gate field effect transistors; reviews; semiconductor device noise; semiconductor thin films; silicon compounds; wide band gap semiconductors; 1/f noise; GaAlN; GaN; SiC; dimensionless Hooge parameter; extremely low noise level; field effect transistors; gate leakage current; generation recombination noise; low-frequency noise; spectral noise density; transient behaviour; wide-band-gap films; wide-band-gap semiconductor devices; wide-gap semiconductors;
  • fLanguage
    English
  • Journal_Title
    Circuits, Devices and Systems, IEE Proceedings -
  • Publisher
    iet
  • ISSN
    1350-2409
  • Type

    jour

  • DOI
    10.1049/ip-cds:20020328
  • Filename
    999111