Title : 
Guest editorial special section on microelectronic test structures
         
        
            Author : 
Hazama, Hirofumi
         
        
            Author_Institution : 
Toshiba Corporation Semiconductor Company
         
        
        
        
        
            fDate : 
5/1/2002 12:00:00 AM
         
        
        
        
            Keywords : 
CMOS technology; Circuit testing; Manufacturing processes; Material properties; Materials testing; Microelectronics; Nonvolatile memory; Parameter extraction; Process design; Very large scale integration;
         
        
        
            Journal_Title : 
Semiconductor Manufacturing, IEEE Transactions on
         
        
        
        
        
            DOI : 
10.1109/TSM.2002.999591