Semiconductor microlenses fabricated by one-step focused ion beam direct writing

Author

Fu, Yongqi ; Bryan, Ngoi KokAnn

Author_Institution

Sch. of Mech. & Production Eng., Nanyang Technol. Univ., Singapore

Volume

15

Issue

2

fYear

2002

fDate

5/1/2002 12:00:00 AM

Firstpage

229

Lastpage

231

Abstract

We fabricated a refractive semiconductor micro-lenses using a focused ion beam (FIB) direct writing technique. The simple one-step FIB process produced high-quality micro-lenses of silicon, the most popular and low cost semiconductor material used in optoelectronics. A spherical Si microlens with a nominal lens diameter of 48 μm exhibited a radius curvature and focal length of 100 and 40 μm, respectively. The maximum derivation between the measured and designed profiles is less than λ/100. The surface roughness, RMS, measured by use of atomic force microscope in 1× 1 μm² square area, is 1.1 nm. This microlens fabrication method could be readily applicable due to the simplicity in processing and the high-quality results

Keywords

atomic force microscopy; focused ion beam technology; microlenses; optical collimators; optical fabrication; surface topography; 100 micron; 40 micron; 48 micron; Si; atomic force microscope; focal length; nominal lens diameter; one-step focused ion beam direct writing; optoelectronics; radius curvature; refractive semiconductor microlenses; surface roughness; Atomic force microscopy; Atomic measurements; Costs; Force measurement; Ion beams; Lenses; Microoptics; Semiconductor materials; Silicon; Writing;

fLanguage

English

Journal_Title

Semiconductor Manufacturing, IEEE Transactions on

Publisher

ieee

ISSN

0894-6507

Type

jour

DOI

10.1109/66.999597

Filename

999597