DocumentCode
1280650
Title
Junction influence on drain current transients in partially-depleted SOI MOSFETs
Author
Ionescu, A.M. ; Chovet, A. ; Chaudier, F.
Author_Institution
ENSERG, Grenoble, France
Volume
33
Issue
20
fYear
1997
fDate
9/25/1997 12:00:00 AM
Firstpage
1740
Lastpage
1742
Abstract
A model and a numerical-simulation-based demonstration of source and drain junction influence on drain current transients in floating-body partially-depleted (PD) SOI MOSFETs are presented. The investigated transient regime is a Zerbst-type one. It is shown that the junction contribution strongly influences carrier generation processes and therefore affects the accuracy of generation lifetime evaluation when the transistor channel length is reduced. In SOI MOSFETs, the thorough investigation of the contribution of generation processes is essentially two-dimensional
Keywords
MOSFET; carrier lifetime; semiconductor device models; silicon-on-insulator; transients; Zerbst-type transient regime; carrier generation processes; drain current transients; drain junction; floating-body partially-depleted SOI MOSFETs; generation lifetime evaluation; model; numerical-simulation-based demonstration; source junction; transistor channel length; two-dimensional generation processes;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19971169
Filename
629569
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