DocumentCode :
1280650
Title :
Junction influence on drain current transients in partially-depleted SOI MOSFETs
Author :
Ionescu, A.M. ; Chovet, A. ; Chaudier, F.
Author_Institution :
ENSERG, Grenoble, France
Volume :
33
Issue :
20
fYear :
1997
fDate :
9/25/1997 12:00:00 AM
Firstpage :
1740
Lastpage :
1742
Abstract :
A model and a numerical-simulation-based demonstration of source and drain junction influence on drain current transients in floating-body partially-depleted (PD) SOI MOSFETs are presented. The investigated transient regime is a Zerbst-type one. It is shown that the junction contribution strongly influences carrier generation processes and therefore affects the accuracy of generation lifetime evaluation when the transistor channel length is reduced. In SOI MOSFETs, the thorough investigation of the contribution of generation processes is essentially two-dimensional
Keywords :
MOSFET; carrier lifetime; semiconductor device models; silicon-on-insulator; transients; Zerbst-type transient regime; carrier generation processes; drain current transients; drain junction; floating-body partially-depleted SOI MOSFETs; generation lifetime evaluation; model; numerical-simulation-based demonstration; source junction; transistor channel length; two-dimensional generation processes;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19971169
Filename :
629569
Link To Document :
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