• DocumentCode
    1280650
  • Title

    Junction influence on drain current transients in partially-depleted SOI MOSFETs

  • Author

    Ionescu, A.M. ; Chovet, A. ; Chaudier, F.

  • Author_Institution
    ENSERG, Grenoble, France
  • Volume
    33
  • Issue
    20
  • fYear
    1997
  • fDate
    9/25/1997 12:00:00 AM
  • Firstpage
    1740
  • Lastpage
    1742
  • Abstract
    A model and a numerical-simulation-based demonstration of source and drain junction influence on drain current transients in floating-body partially-depleted (PD) SOI MOSFETs are presented. The investigated transient regime is a Zerbst-type one. It is shown that the junction contribution strongly influences carrier generation processes and therefore affects the accuracy of generation lifetime evaluation when the transistor channel length is reduced. In SOI MOSFETs, the thorough investigation of the contribution of generation processes is essentially two-dimensional
  • Keywords
    MOSFET; carrier lifetime; semiconductor device models; silicon-on-insulator; transients; Zerbst-type transient regime; carrier generation processes; drain current transients; drain junction; floating-body partially-depleted SOI MOSFETs; generation lifetime evaluation; model; numerical-simulation-based demonstration; source junction; transistor channel length; two-dimensional generation processes;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19971169
  • Filename
    629569