• DocumentCode
    1282077
  • Title

    Memory switching in amorphous silicon-rich silicon carbide

  • Author

    Shannon, J.M. ; Lau, S.P.

  • Author_Institution
    Dept. of Electron. & Electr. Eng., Surrey Univ., Guildford, UK
  • Volume
    35
  • Issue
    22
  • fYear
    1999
  • fDate
    10/28/1999 12:00:00 AM
  • Firstpage
    1976
  • Lastpage
    1977
  • Abstract
    Memory switching has been observed in simple metal-semiconductor-metal structures containing lightly amorphous silicon carbide. In common with switching in other disordered materials, a forming process was used to initiate the switching process. A range of switching effects were found but a particularly interesting transition could be explained by a change in the number of charged defect states in a defect band and the current flowing through them via the Poole-Frenkel effect
  • Keywords
    Poole-Frenkel effect; amorphous semiconductors; defect states; electrical conductivity transitions; metal-semiconductor-metal structures; silicon compounds; Poole-Frenkel effect; SiC; amorphous silicon carbide; charged defect states; disordered material; memory switching; metal-semiconductor-metal structure;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19991296
  • Filename
    811105