Title :
Trends in lithography
Author_Institution :
Aerosp. Corp., Los Angeles, CA, USA
Abstract :
Current capabilities and advances in optical electron-beam, X-ray, and ion-beam lithography are discussed. Attention is restricted to the creation of the resist pattern. Equipment, resists, and processing are examined.<>
Keywords :
lithography; resists; X-ray; ion-beam; lithography; optical electron-beam; processing; resist pattern; Electron beams; Electron optics; Focusing; Integrated circuit technology; Integrated optics; Lithography; Particle beam optics; Photonic integrated circuits; Production; Resists;
Journal_Title :
Circuits and Devices Magazine, IEEE
