DocumentCode :
1283356
Title :
A New Quasi-2-D Threshold Voltage Model for Short-Channel Junctionless Cylindrical Surrounding Gate (JLCSG) MOSFETs
Author :
Chiang, Te-Kuang
Author_Institution :
Electr. Eng. Dept., Nat. Univ. of Kaohsiung, Kaohsiung, Taiwan
Volume :
59
Issue :
11
fYear :
2012
Firstpage :
3127
Lastpage :
3129
Abstract :
Based on the quasi-2-D scaling equation, a new threshold voltage model for short-channel junctionless (JL) cylindrical surrounding gate (JLCSG) MOSFETs is developed. The model explicitly shows how the device parameters such as the silicon thickness, oxide thickness, drain bias, and channel length affect the threshold voltage behavior. The model can also be extendable to its counterpart of junction-based cylindrical surrounding gate (JBCSG) MOSFETs. The model is verified by its calculated results matching well with those of the 3-D numerical simulator and can be easily used to explore the threshold voltage characteristics of JLCSG MOSFETs for its simple formula and computational efficiency.
Keywords :
MOSFET; JLCSG MOSFET; channel length; drain bias; oxide thickness; quasi-2D scaling equation; quasi-2D threshold voltage model; short-channel junctionless cylindrical surrounding gate MOSFET; silicon thickness; Electric potential; Logic gates; MOSFETs; Mathematical model; Semiconductor device modeling; Threshold voltage; JL cylindrical surrounding gate (JLCSG) MOSFETs; Junctionless (JL) cylindrical; quasi-2-D scaling equation; threshold voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2012.2212904
Filename :
6298950
Link To Document :
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