DocumentCode :
1283936
Title :
Hot-electron-induced minority-carrier generation in bipolar junction transistors
Author :
Ishiuchi, Hidemi ; Tamba, Nobuo ; Shott, John D. ; Knorr, Christopher J. ; Wong, S. Simon
Author_Institution :
Integrated Circuits Lab., Stanford Univ., CA, USA
Volume :
11
Issue :
11
fYear :
1990
Firstpage :
490
Lastpage :
492
Abstract :
The authors report on the observation and analysis of minority-carrier generation in the collector and the substrate of n-p-n bipolar junction transistors as a result of photons which are generated in the collector-base depletion region. Both the substrate current and the additional leakage current peak at V/sub BE/ approximately 0.8 V. In the authors´ model of the phenomena, the photons induce the generation of carriers both in the depletion region and in the neutral region. The generated minority carriers in the neutral region diffuse and contribute to the substrate current and the junction leakage current. The contribution of the carriers that are generated in the depletion region is not dominant.<>
Keywords :
bipolar transistors; hot carriers; leakage currents; minority carriers; 0.8 V; carrier diffusion; collector; collector-base depletion region; depletion region; hot electron effects; junction leakage current; minority-carrier generation; n-p-n bipolar junction transistors; neutral region; photon induced carrier generation; photons; substrate; substrate current; Doping; Impact ionization; Laboratories; Leakage current; MOSFETs; Semiconductor process modeling; Substrates; Transistors; Voltage;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/55.63010
Filename :
63010
Link To Document :
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