DocumentCode :
1285220
Title :
Low-loss PECVD silica channel waveguides for optical communications
Author :
Grand, G. ; Jadot, J.P. ; Denis, H. ; Valette, S. ; Fournier, A. ; Grouillet, A.M.
Author_Institution :
LETI, CEA-CENG, Grenoble, France
Volume :
26
Issue :
25
fYear :
1990
Firstpage :
2135
Lastpage :
2137
Abstract :
The authors report reproducible measurements of propagation losses in channel waveguides fabricated on silicon substrate by PECVD. The average value obtained from more than 50 different channel guides is 0.1 dB/cm at 1.55 mu m. The behaviour with wavelength is also presented and discussed.
Keywords :
integrated optics; optical communication equipment; optical losses; optical waveguides; plasma CVD; silicon compounds; 1.55 micron; IOS2 technology; PECVD; Si; Si-SiO 2; channel waveguides; integrated optics; optical communications; propagation losses; reproducible measurements;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19901375
Filename :
59642
Link To Document :
بازگشت