DocumentCode :
1286897
Title :
3510-V 390- \\hbox {m}\\Omega \\cdot\\hbox {cm}^{2} 4H-SiC Lateral JFET on a Semi-Insulating Substrate
Author :
Huang, Chih-Fang ; Kan, Cheng-Li ; Wu, Tian-Li ; Lee, Meng-Chia ; Liu, Yo-Zthu ; Lee, Kung-Yen ; Zhao, Feng
Author_Institution :
Inst. of Electron. Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan
Volume :
30
Issue :
9
fYear :
2009
Firstpage :
957
Lastpage :
959
Abstract :
The performance of high-voltage 4H-SiC lateral JFETs on a semi-insulating substrate is reported in this letter. The design of the voltage-supporting layers is based on the charge compensation of p- and n-type epilayers. The best measured breakdown voltage is 3510 V, which, to the authors´ knowledge, is the highest value ever reported for SiC lateral switching devices. The Ron of this device is 390 m????cm2, in which 61% is due to the drift-region resistance. The BV2/Ron is 32 MW/cm2, which is typical among other reported SiC lateral devices.
Keywords :
electric breakdown; junction gate field effect transistors; silicon compounds; substrates; wide band gap semiconductors; SiC; breakdown voltage; charge compensation; drift-region resistance; high-voltage lateral JFET; n-type epilayers; p-type epilayers; semiinsulating substrate; voltage 3510 V; voltage-supporting layers; High voltage; JFETs; lateral; silicon carbide;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2009.2027722
Filename :
5191105
Link To Document :
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