• DocumentCode
    1287334
  • Title

    A monolithic dual-band HgCdTe infrared detector structure

  • Author

    Parish, G. ; Musca, C.A. ; Siliquini, J.F. ; Antoszewki, J. ; Dell, J.M. ; Nener, B.D. ; Faraone, L. ; Gouws, G.J.

  • Author_Institution
    Dept. of Electr. & Electron. Eng., Western Australia Univ., Nedlands, WA, Australia
  • Volume
    18
  • Issue
    7
  • fYear
    1997
  • fDate
    7/1/1997 12:00:00 AM
  • Firstpage
    352
  • Lastpage
    354
  • Abstract
    A monolithic HgCdTe photoconductive device structure is presented that is suitable for dual-band optically registered infrared photodetection in the two atmospheric transmission windows of 3-5 μm and 8-12 μm, which correspond to the mid-wave and long-wave infrared bands; MWIR and LWIR, respectively. The proposed structure employs a wider bandgap isolating layer between the two photosensitive layers such that an effective electrical barrier is formed thus prohibiting carrier transport between the two infrared absorbing layers of different cutoff wavelengths. The technology is demonstrated using a mature HgCdTe photoconductive device fabrication process. The resulting detectors have an MWIR cutoff of 5.0 μm, and LWIR cutoff of 10.5 μm.
  • Keywords
    II-VI semiconductors; cadmium compounds; infrared detectors; mercury compounds; photoconducting devices; 3 to 5 micron; 8 to 12 micron; HgCdTe; LWIR band; MWIR band; atmospheric transmission window; dual-band optically registered infrared photodetector; electrical barrier; isolating layer; monolithic photoconductive device; Annealing; Dual band; Fabrication; Infrared detectors; Isolation technology; Optical devices; Passivation; Photoconducting devices; Photoconducting materials; Photonic band gap;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/55.596934
  • Filename
    596934