• DocumentCode
    1287358
  • Title

    Elementary scattering theory of the Si MOSFET

  • Author

    Lundstrom, Mark

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN, USA
  • Volume
    18
  • Issue
    7
  • fYear
    1997
  • fDate
    7/1/1997 12:00:00 AM
  • Firstpage
    361
  • Lastpage
    363
  • Abstract
    A simple one-flux scattering theory of the silicon MOSFET is introduced. Current-voltage (I-V) characteristics are expressed in terms of scattering parameters rather than a mobility. For long-channel transistors, the results reduce to conventional drift-diffusion theory, but they also apply to devices in which the channel length is comparable to or even shorter than the mean-free-path. The results indicate that for very short channels the transconductance is limited by carrier injection from the source. The theory also indicates that evaluation of the drain current in short-channel MOSFETs is a near-equilibrium transport problem, even though the channel electric field is large in magnitude and varies rapidly in space.
  • Keywords
    MOSFET; S-parameters; elemental semiconductors; semiconductor device models; silicon; Si; carrier injection; current-voltage characteristics; drain current; drift-diffusion theory; long-channel transistor; near-equilibrium transport; one-flux scattering theory; scattering parameters; short-channel transistor; silicon MOSFET; transconductance; Backscatter; Bipolar transistors; Electrons; MOSFET circuits; Scattering parameters; Silicon; Steady-state; Surface treatment; Threshold voltage; Transconductance;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/55.596937
  • Filename
    596937