Low-Loss Multiple-Slot Waveguides Fabricated by Optical Lithography and Atomic Layer Deposition

Author

Karvonen, Lasse ; Säynätjoki, Antti ; Chen, Ya ; Tu, Xiaoguang ; Liow, Tsung-Yang ; Hiltunen, Jussi ; Hiltunen, Marianne ; Lo, Guo-Qiang ; Honkanen, Seppo

Author_Institution

Sch. of Electr. Eng., Aalto Univ., Aalto, Finland

Volume

24

Issue

22

fYear

2012

Firstpage

2074

Lastpage

2076

Abstract

We demonstrate silicon-based multiple-slot waveguides filled with dual atomic layer deposited oxide layers. Slot modes for both polarizations, transverse electric (TE) and transverse magnetic (TM), are supported in the waveguide. Propagation loss in the order of 8 dB/cm is achieved for the TE-polarization and 4 dB/cm for the TM-polarization in the waveguides with dual (Al₂O₃-TiO₂) thin film layers. The devices are fabricated using low-temperature complementary metal-oxide-semiconductor compatible processes. To our knowledge, this is the first demonstration of dual-filled slot waveguides.

Keywords

CMOS integrated circuits; aluminium compounds; atomic layer deposition; integrated optoelectronics; light polarisation; light propagation; optical fabrication; optical films; optical losses; optical waveguides; photolithography; silicon-on-insulator; thin films; titanium compounds; Al₂O₃-TiO₂; Si; TE polarizations; TM polarizations; dual atomic layer deposited oxide layers; dual thin film layers; dual-filled slot waveguides; low-loss multiple-slot waveguides; low-temperature complementary metal-oxide-semiconductor compatible processes; optical lithography; propagation loss; slot modes; transverse electric polarizations; transverse magnetic polarizations; Lithography; Optical waveguides; Optimized production technology; Propagation losses; Rails; Silicon; Atomic layer deposition (ALD); integrated optics; slot waveguide;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/LPT.2012.2219856

Filename

6307817