DocumentCode :
1287841
Title :
The Effect of Self-Heating in LDMOSFET Expansion Regime
Author :
Chou, Hsueh-Liang ; Ng, Jacky C W ; Liou, Ruey-Hsin ; Jong, Yu-Chang ; Tuan, Hsiao-Chin ; Huang, Chih-Fang ; Gong, Jeng
Author_Institution :
Dept. of Electr. Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan
Volume :
59
Issue :
11
fYear :
2012
Firstpage :
3042
Lastpage :
3047
Abstract :
In this paper, it is the first time that the effect of self-heating of LDMOS transistors operating in the so-called expansion regime of the output characteristics is studied. Experimental characterization and numerical simulations are used to demonstrate that, in order to explain the origin of the current enhancement phenomenon observed in the output characteristics of LDMOS transistors biased at high gate and drain voltages (which is named as the expansion regime), the thermal effect of the device self-heating, in addition to the proposed intrinsic MOSFET saturation, has to be considered. This is supported by analyzing the temperature, charged carrier velocity, impact ionization rate, and electric field at different positions in the LDMOS transistors biased at different gate and drain voltages.
Keywords :
MOSFET; impact ionisation; LDMOS transistor; LDMOSFET expansion regime; charged carrier velocity; drain voltage; electric field; gate voltage; impact ionization rate; self-heating effect; temperature; thermal effect; Impact ionization; Isothermal processes; Logic gates; MOSFET circuits; Temperature; Temperature measurement; Transistors; Current enhancement; Kirk effect; LDMOS; expansion regime; impact ionization; isothermal simulation; nonisothermal simulation; reduced surface field (RESURF); self-heating; thermal effect;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2012.2214036
Filename :
6307837
Link To Document :
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