DocumentCode :
128809
Title :
Development of an electro-thermal resistive switching model based on O-Frenkel pairs to study reset and set mechanisms in HfO2-based RRAM cells
Author :
Cueto, O. ; Payet, Anthony ; Cabout, Thomas
Author_Institution :
Univ. Grenoble Alpes, Grenoble, France
fYear :
2014
fDate :
9-11 Sept. 2014
Firstpage :
45
Lastpage :
48
Abstract :
An electro-thermal resistive switching model based on O-Frenkel pairs is presented. This model relies on partial differential equations and is used to simulate reset and set mechanisms for HfO2-based RRAM devices starting from an existing conductive filament. First simulations indicate that the model can fairly reproduce experimental ON and OFF resistances.
Keywords :
hafnium compounds; integrated circuit modelling; partial differential equations; random-access storage; HfO2; O-Frenkel pairs; ON-OFF resistance; conductive filament; electrothermal resistive switching model; hafnium dioxide-based RRAM cells; partial differential equation; reset mechanism; set mechanism; Conductivity; Hafnium compounds; Ions; Mathematical model; Numerical models; Semiconductor device modeling; Switches; O-Frenkel pairs; oxide based RRAM simulation; switching model;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices (SISPAD), 2014 International Conference on
Conference_Location :
Yokohama
ISSN :
1946-1569
Print_ISBN :
978-1-4799-5287-8
Type :
conf
DOI :
10.1109/SISPAD.2014.6931559
Filename :
6931559
Link To Document :
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