DocumentCode :
128879
Title :
Numerical simulation of current noise caused by potential fluctuation in nanowire FET with an oxide trap
Author :
Furubayashi, Yuki ; Ogawa, Michiko ; Souma, Satofumi
Author_Institution :
Dept. of Electr. & Electron. Eng., Kobe Univ., Kobe, Japan
fYear :
2014
fDate :
9-11 Sept. 2014
Firstpage :
201
Lastpage :
204
Abstract :
We present a theoretical study on the temporal current fluctuation in nanowire FET caused by the presence of a single gate oxide trap through the Coulomb interaction. Our calculations based on the scattering theoretical formulation of the current noise showed that the presence of the trap level in the gate insulator gives rise to the enhancement of the noise at a specific gate voltage. The peak position of the noise is related to the capacitive coupling strengths of the trap to the channel and the gate electrode, suggesting that the current noise can be used to measure such physical quantities.
Keywords :
MOSFET; current fluctuations; nanoelectronics; nanowires; noise; semiconductor device models; Coulomb interaction; capacitive coupling strengths; current noise; gate electrode; gate insulator; nanowire FET; numerical simulation; single gate oxide trap; temporal current fluctuation; trap level; Electric potential; Electron traps; Electrostatics; Equations; Logic gates; Noise; Scattering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices (SISPAD), 2014 International Conference on
Conference_Location :
Yokohama
ISSN :
1946-1569
Print_ISBN :
978-1-4799-5287-8
Type :
conf
DOI :
10.1109/SISPAD.2014.6931598
Filename :
6931598
Link To Document :
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