Title :
Reactor modeling of magnetically enhanced capacitive RF discharge
Author :
Park, Jong Chul ; Kang, Bongkoo
Author_Institution :
Dept. of Electr. Eng., Pohang Univ. of Sci. & Technol., South Korea
fDate :
6/1/1997 12:00:00 AM
Abstract :
Magnetic and collisional effects on capacitive radio frequency (RF) discharges for magnetically enhanced reactive ion etching (MERIE) are investigated. Using simplified plasma and sheath models, a collisional magnetic-sheath equation that governs the sheath dynamics under a de magnetic field crossed with a sinusoidal RF electric field is obtained. The sheath equation includes global effects of the bulk plasma. Together with the power-balance equation and the particle-conservation equation, the sheath equation is used to extract a circuit model and predict the electrical behavior of MERIE reactors. Numerical results on the plasma density and the power in MERIE reactors agree well with reported experimental results and the circuit model describes the repeated discharge properties well
Keywords :
high-frequency discharges; plasma collision processes; plasma density; plasma sheaths; reactors (electric); semiconductor device manufacture; sputter etching; MERIE reactors; bulk plasma; capacitive radiofrequency discharges; circuit model; collisional effects; electrical behavior; global effects; magnetic effects; magnetic-sheath equation; magnetically enhanced capacitive RF discharge; magnetically enhanced reactive ion etching; particle-conservation equation; plasma density; power-balance equation; reactor modeling; sheath models; sinusoidal RF electric field; Circuits; Equations; Etching; Inductors; Magnetic fields; Plasma applications; Plasma density; Plasma sheaths; Predictive models; Radio frequency;
Journal_Title :
Plasma Science, IEEE Transactions on
