Title :
New perspective on lifetime prediction approach for BTI and HCI stressed device and its impact on circuit lifetime
Author :
Min-Chul Park ; Gi-Yeong Yang ; Joon-Sung Yang ; Keun-Ho Lee ; Young-Kwan Park
Author_Institution :
Semicond. R&D Center, Samsung Electron. Co., Ltd., Hwasung, South Korea
Abstract :
Device and circuit lifetime is investigated for poly silicon gated MOSFET. New findings are: (1) More than 1 order lifetime is increased by quantifying the influence of poly depletion effect (PDE) and accumulated trap charge effect (ATCE). (2) We demonstrate that conventional lifetime model produce an incorrect and reverse lifetime result for each degradation data measured by fast and slow method. (3) We evaluate the impact on circuit parameter, propagation delay time (tPD), degradation in the light of new findings.
Keywords :
MOSFET; hot carriers; negative bias temperature instability; silicon; ATCE; HCI stressed device; NBTI; PDE; Si; accumulated trap charge effect; circuit lifetime; device lifetime; hot carrier injection; lifetime model; lifetime prediction approach; negative bias temperature instabilty; polydepletion effect; polysilicon gated MOSFET; propagation delay time; Degradation; Human computer interaction; Integrated circuit modeling; Logic gates; Mathematical model; Reliability; Velocity measurement; HCI; NBTI; circuit lifetime prediction; lifetime prediction; poly depletion; trapping charge effect;
Conference_Titel :
Simulation of Semiconductor Processes and Devices (SISPAD), 2014 International Conference on
Conference_Location :
Yokohama
Print_ISBN :
978-1-4799-5287-8
DOI :
10.1109/SISPAD.2014.6931632