DocumentCode
1289996
Title
A framework for robust run by run control with lot delayed measurements
Author
Baras, John S. ; Patel, Nital S.
Author_Institution
Dept. of Electr. Eng., Maryland Univ., College Park, MD, USA
Volume
10
Issue
1
fYear
1997
fDate
2/1/1997 12:00:00 AM
Firstpage
75
Lastpage
83
Abstract
This paper considers the run by run control problem. We develop a framework to solve such a problem in a robust fashion. The framework also encompasses the case when the system is subject to delayed measurements. Recent results available for the control of such systems are reviewed, and two examples are presented. The first example is based on the end-pointing problem for a deposition process, and is subject to noise which has both Gaussian and uniform components. The second one is concerned with rate control in an LPCVD reactor
Keywords
chemical vapour deposition; process control; robust control; Gaussian noise; LPCVD reactor; deposition; end-pointing; lot delayed measurements; rate control; robust run by run control; semiconductor processing; uniform noise; Automatic control; Automatic generation control; Control systems; Delay; Electronics industry; Gaussian noise; Inductors; Noise robustness; Robust control; Semiconductor device noise;
fLanguage
English
Journal_Title
Semiconductor Manufacturing, IEEE Transactions on
Publisher
ieee
ISSN
0894-6507
Type
jour
DOI
10.1109/66.554488
Filename
554488
Link To Document