Title :
Thermal rollover characteristics up to 150/spl deg/C of buried-stripe type 980-nm laser diodes with a current injection window delineated by a SiNx layer
Author :
Horie, Hideyoshi ; Yamamoto, Yoshitaka ; Arai, Nobuhiro ; Ohta, Hirotaka
Author_Institution :
Opto-Electron. Res. & Technol. Dev. Center, Mitsubishi Chem. Corp., Ibaraki, Japan
Abstract :
In order to improve device robustness of buried-stripe type 980-nm laser diodes against excess current injection even under high temperature operation, we have introduced a current injection window delineated by a SiN/sub x/ layer to suppress current injection near the facets. The devices showed complete thermal rollover characteristics at temperatures up to 150/spl deg/C with 800-mA continuous-wave current injection while devices without the layer failed due to front facet degradation during high temperature tests. We think the improvement of device robustness with a SiN/sub x/ layer is attributable to suppression of nonradiative recombination of carriers overflowing from the active layers near the facet and to reduced light absorption at the facet brought about by suppression of carrier-induced bandgap shrinkage.
Keywords :
III-V semiconductors; gallium arsenide; high-temperature electronics; indium compounds; laser reliability; quantum well lasers; semiconductor device reliability; 25 to 150 C; 800 mA; 980 nm; In/sub 0.16/Ga/sub 0.84/As-GaAs; SiN; SiN/sub x/ layer delineation; buried-stripe type laser diodes; carrier-induced bandgap shrinkage; catastrophic optical damage; continuous-wave current injection; current injection suppression; current injection window; device robustness; front facet degradation; high temperature operation; high temperature tests; light absorption; nonradiative carrier recombination suppression; strained double quantum wells; thermal rollover characteristics; Chemical technology; Degradation; Diode lasers; Gallium arsenide; Optical refraction; Optical variables control; Robustness; Silicon compounds; Stimulated emission; Temperature;
Journal_Title :
Photonics Technology Letters, IEEE