Title :
Hot-Carrier Stress Effect on a CMOS 65-nm 60-GHz One-Stage Power Amplifier
Author :
Quémerais, Thomas ; Moquillon, Laurence ; Huard, Vincent ; Fournier, Jean-Michel ; Benech, Philippe ; Corrao, Nicolas ; Mescot, Xavier
Author_Institution :
STMicroelectronics, Crolles, France
Abstract :
The effects of RF hot-carrier stress on the characteristics of 60-GHz power amplifiers (PAs) on a CMOS 65-nm process are investigated, for the first time, in this letter. A reliability study is made on a one-stage PA to validate an aging model and the degradation explanation. A drop of 16% of the gain, 17% of the 1-dB output compression point (OCP1 dB), and 17% of the Psat are measured at 60 GHz after 50 h of stress under Vdd = 1.65 V with Pin = 0 dBm and Vdd = 1.9 V with Pin = -10 dBm at 60-GHz frequency.
Keywords :
CMOS integrated circuits; hot carriers; power amplifiers; CMOS process; RF hot-carrier stress effect; complementary metal-oxide-semiconductor; frequency 60 GHz; one-stage power amplifier; output compression point; size 65 nm; time 50 h; voltage 1.65 V; voltage 1.9 V; Aging; CMOS integrated circuits; CMOS process; Current measurement; Degradation; Hot carrier effects; Hot carriers; Power amplifiers; Radio frequency; Radiofrequency amplifiers; Semiconductor device modeling; Stress; Stress measurement; 65-nm technology; CMOS millimeter-wave (MMW) power amplifier (PA); hot-carrier stress; reliability;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2010.2055535