DocumentCode :
1290659
Title :
A-RAM Memory Cell: Concept and Operation
Author :
Rodriguez, Noel ; Gamiz, Francisco ; Cristoloveanu, Sorin
Author_Institution :
Dept. of Electron., Univ. de Granada, Granada, Spain
Volume :
31
Issue :
9
fYear :
2010
Firstpage :
972
Lastpage :
974
Abstract :
Capacitorless single-transistor (1T) DRAM cells are envisioned for replacing the conventional DRAMs where the storage capacitor can hardly be further miniaturized. We propose a totally different 1T-DRAM cell, named A-RAM, which is compatible with SOI CMOS deep scaling. Its novelty comes from the partitioning of the transistor body into two distinct ultrathin regions separated by a thin dielectric. The holes are physically confined in the upper semibody and govern the electron current flowing into the lower semibody. The systematic simulations show that the A-RAM is attractive for low-power and embedded memory applications since it exhibits enhanced state definition, retention, scalability, and simple waveforms for word and bit lines.
Keywords :
DRAM chips; silicon-on-insulator; A-RAM memory cell; SOI CMOS deep scaling; capacitorless single-transistor DRAM cell; electron current flowing; storage capacitor; systematic simulation; thin dielectric; Capacitance; Capacitors; Charge carrier processes; Computer architecture; Dielectrics; Lead compounds; Logic gates; MOSFETs; Microprocessors; Random access memory; Scalability; Silicon on insulator technology; Transistors; Voltage control; A-RAM; capacitorless; floating body; scaling; silicon on insulator (SOI); single-transistor DRAM (1T-DRAM); supercoupling; volatile memory;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2010.2055531
Filename :
5545354
Link To Document :
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