DocumentCode :
1291379
Title :
Photochemical processing of semiconductors: New applications for visible and ultraviolet lasers
Author :
Eden, J. Gary
Author_Institution :
Illinois Univ., Urbana, IL, USA
Volume :
2
Issue :
1
fYear :
1986
Firstpage :
18
Lastpage :
24
Abstract :
A wide variety of semiconductor and metal films have recently been grown, doped, or etched by laser photochemical processes. While still early in its development, laser-driven processing of semiconductor devices appears promising as a supplement to existing processing techniques and particularly in the fabrication of III-V compound and custom devices. A discussion of film growth and etching shows that the laser is capable of performing all of the basic processing steps required in device fabrication without the need for photolithographic techniques. The boundaries of the field are set only by the number of semiconductor and metal-containing compounds having reasonable vapor pressure (~1 torr) at several hundred degrees centigrade or less.
Keywords :
etching; laser beam applications; photochemistry; semiconductor doping; semiconductor growth; III-V compound; custom devices; etching; film growth; laser photochemical processes; metal films; semiconductor doping; semiconductors; ultraviolet lasers; vapor pressure; visible lasers; Chemical lasers; Films; Gas lasers; Laser beams; Semiconductor lasers; Substrates; Surface treatment;
fLanguage :
English
Journal_Title :
Circuits and Devices Magazine, IEEE
Publisher :
ieee
ISSN :
8755-3996
Type :
jour
DOI :
10.1109/MCD.1986.6311766
Filename :
6311766
Link To Document :
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