• DocumentCode
    1291395
  • Title

    Dynamic-stress-induced enhanced degradation of 1/f noise in n-MOSFETs

  • Author

    Xu, J.P. ; Lai, P.T. ; Cheng, Y.C.

  • Author_Institution
    Dept. of Solid State Electron., Huazhong Univ. of Sci. & Technol., Wuhan, China
  • Volume
    47
  • Issue
    1
  • fYear
    2000
  • fDate
    1/1/2000 12:00:00 AM
  • Firstpage
    109
  • Lastpage
    112
  • Abstract
    AC-stress-induced degradation of 1/f noise is investigated for n-MOSFETs with thermal oxide or nitrided oxide as gate dielectric, and the physical mechanisms involved are analyzed. It is found that the degradation of 1/f noise under AC stress is far more serious than that under DC stress. For an ac stress of VG=0~0.5 VD, generations of both interface states (ΔDit) and neutral electron traps (ΔNet) are responsible for the increase of 1/f noise, with the former being dominant. For another AC stress of V G=0~VD. a large increase of 1/f noise is observed for the thermal-oxide device, and is attributed to enhanced ΔNet and generation of another specie of electron traps, plus a small amount of ΔDit. Moreover, under the two types of AC stress conditions, much smaller degradation of 1/f noise is observed for the nitrided device due to considerably improved oxide/Si interface and near-interface oxide qualities associated with interfacial nitrogen incorporation
  • Keywords
    1/f noise; MOSFET; dielectric thin films; electron traps; interface states; semiconductor device noise; semiconductor device reliability; 1/f noise; AC-stress-induced degradation; DC stress; dynamic-stress-induced enhanced degradation; gate dielectric; interface states; n-MOSFETs; near-interface oxide qualities; neutral electron traps; nitrided oxide; physical mechanisms; thermal oxide; thermal-oxide device; AC generators; Annealing; Dielectrics; Electron traps; Hot carriers; Integrated circuit noise; MOSFET circuits; Noise generators; Thermal degradation; Thermal stresses;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.817575
  • Filename
    817575