DocumentCode :
1291999
Title :
A high-performance AlInAs/InGaAs/InP DHBT K-band power cell
Author :
Virk, R.S. ; Chen, M.Y. ; Chanh Nguyen ; Takyiu Liu ; Matloubian, M. ; Rensch, D.B.
Author_Institution :
Hughes Res. Labs., Malibu, CA, USA
Volume :
7
Issue :
10
fYear :
1997
Firstpage :
323
Lastpage :
325
Abstract :
In this work the device design and power performance of several AlInAs/InGaAs/InP double heterojunction bipolar transistors (DHBTs) are reported for 18 GHz. The power cells utilize a wet chemical etching technique to create a micro-airbridge base connection and to remove extrinsic collector material from beneath the base which both contribute to a reduced base-collector capacitance and improved fmax and power gain. For class B operation, the eight-finger 2 μm×30 μm power cells achieved 1.17-W output power, which indicates 4.88-W/mm emitter length, with 54% power-added efficiency (PAE) and 7.3-dB gain, This is believed to be the best combination of PAE and output power reported for this power density at K-band frequencies.
Keywords :
III-V semiconductors; aluminium compounds; etching; gallium arsenide; heterojunction bipolar transistors; indium compounds; microwave bipolar transistors; microwave power transistors; power bipolar transistors; 1.17 W; 18 GHz; 54 percent; 7.3 dB; AlInAs-InGaAs-InP; DHBT K-band power cell; class B operation; double heterojunction bipolar transistors; micro-airbridge base connection; power HBT; power performance; wet chemical etching technique; Chemicals; Fingers; Frequency; Heterojunction bipolar transistors; Indium gallium arsenide; Indium phosphide; K-band; Parasitic capacitance; Power amplifiers; Power generation;
fLanguage :
English
Journal_Title :
Microwave and Guided Wave Letters, IEEE
Publisher :
ieee
ISSN :
1051-8207
Type :
jour
DOI :
10.1109/75.631189
Filename :
631189
Link To Document :
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