DocumentCode :
129236
Title :
Investigations on quality factor of high frequency laterally vibrating LN on SiO2 microresonators
Author :
Lisha Shi ; Piazza, Gianluca
Author_Institution :
Dept. of Electr. & Comput. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA
fYear :
2014
fDate :
3-6 Sept. 2014
Firstpage :
578
Lastpage :
581
Abstract :
This paper presents an investigation on the quality factor (Q) of Laterally Vibrating Resonators (LVRs) based on thin films of Y-cut ion-sliced Lithium Niobate (LN) on silicon dioxide (SiO2) that were first demonstrated in [1]. Devices operating between 500 MHz and 1.5 GHz were designed and fabricated to explore the dependence of Q on: (i) electrode coverage and location, (ii) air damping, (iii) temperature, (iv) frequency, and (v) vibration mode. A considerable increase in Q was attained when using smaller electrode coverage or strategically placing the electrodes at low strain locations. These results clearly indicate the impact of interfacial loss on Q. A minimal dependence of Q on pressure was found, implying that air damping has a minor effect in setting Q for these devices. Q vs. temperature of a characteristic resonator was also measured, hinting that damping mechanisms of thermoelastic nature are dominant in these devices.
Keywords :
Q-factor; lithium compounds; micromechanical resonators; silicon compounds; vibrations; Laterally Vibrating Resonators; LiNbOx; SiO2; air damping; electrode coverage; interfacial loss; microresonators; quality factor; vibration mode; Damping; Electrodes; Fingers; Optical resonators; Resonant frequency; Temperature; Temperature measurement; Lithium niobate (LiNbO3); Quality factor (Q); RF MEMS resonator;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ultrasonics Symposium (IUS), 2014 IEEE International
Conference_Location :
Chicago, IL
Type :
conf
DOI :
10.1109/ULTSYM.2014.0142
Filename :
6931858
Link To Document :
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