DocumentCode
1294903
Title
Single Fermi Level Thin-Film CMOS on Glass: The Behavior of Enhancement-Mode PMOSFETs From Cutoff Through Accumulation
Author
Nassar, Christopher James ; Williams, Carlo A Kosik ; Dawson-Elli, David ; Bowman, Robert John
Author_Institution
Dept. of Electr. Eng., Rochester Inst. of Technol., Rochester, NY, USA
Volume
56
Issue
9
fYear
2009
Firstpage
1974
Lastpage
1979
Abstract
A device model which describes the behavior of thin-film transistors fabricated in crystalline silicon on glass is introduced. The dc current-voltage characteristics of fully depleted thin-film silicon p-channel enhancement-mode MOSFETs operated in accumulation is provided. Physically derived expressions are presented for drain current in the accumulation and depletion regions which include the correct dependence on drain voltage, film thickness, and doping level. AC-infin model is realized from cutoff to accumulation by using an interpolant around the flatband voltage and a hyperbolic tangent blending function. The device model shows excellent agreement with measured results for output, transfer, and transconductance characteristics. A compact circuit simulation model has also been implemented in the Spectre circuit simulator using Verilog-A.
Keywords
Fermi level; circuit simulation; doping profiles; elemental semiconductors; glass; hardware description languages; power MOSFET; semiconductor device models; semiconductor doping; semiconductor thin films; silicon; thin film transistors; AC-infin model; Fermi level; Si-SiO2; SiO2; Spectre circuit simulator; Verilog-A; circuit simulation model; crystalline silicon; dc current-voltage characteristics; device model; doping level; drain current; drain voltage; enhancement-mode PMOSFETs; film thickness; flatband voltage; fully depleted thin-film silicon p-channel enhancement-mode MOSFETs; glass; hyperbolic tangent blending function; thin-film CMOS; thin-film transistors; transconductance characteristics; Circuit simulation; Crystallization; Current-voltage characteristics; Glass; MOSFETs; Semiconductor device modeling; Semiconductor process modeling; Silicon; Thin film transistors; Voltage; CMOS; modeling; semiconductor modeling; silicon-on-insulator technology; thin-film transistors;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2009.2026111
Filename
5200328
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