• DocumentCode
    1294903
  • Title

    Single Fermi Level Thin-Film CMOS on Glass: The Behavior of Enhancement-Mode PMOSFETs From Cutoff Through Accumulation

  • Author

    Nassar, Christopher James ; Williams, Carlo A Kosik ; Dawson-Elli, David ; Bowman, Robert John

  • Author_Institution
    Dept. of Electr. Eng., Rochester Inst. of Technol., Rochester, NY, USA
  • Volume
    56
  • Issue
    9
  • fYear
    2009
  • Firstpage
    1974
  • Lastpage
    1979
  • Abstract
    A device model which describes the behavior of thin-film transistors fabricated in crystalline silicon on glass is introduced. The dc current-voltage characteristics of fully depleted thin-film silicon p-channel enhancement-mode MOSFETs operated in accumulation is provided. Physically derived expressions are presented for drain current in the accumulation and depletion regions which include the correct dependence on drain voltage, film thickness, and doping level. AC-infin model is realized from cutoff to accumulation by using an interpolant around the flatband voltage and a hyperbolic tangent blending function. The device model shows excellent agreement with measured results for output, transfer, and transconductance characteristics. A compact circuit simulation model has also been implemented in the Spectre circuit simulator using Verilog-A.
  • Keywords
    Fermi level; circuit simulation; doping profiles; elemental semiconductors; glass; hardware description languages; power MOSFET; semiconductor device models; semiconductor doping; semiconductor thin films; silicon; thin film transistors; AC-infin model; Fermi level; Si-SiO2; SiO2; Spectre circuit simulator; Verilog-A; circuit simulation model; crystalline silicon; dc current-voltage characteristics; device model; doping level; drain current; drain voltage; enhancement-mode PMOSFETs; film thickness; flatband voltage; fully depleted thin-film silicon p-channel enhancement-mode MOSFETs; glass; hyperbolic tangent blending function; thin-film CMOS; thin-film transistors; transconductance characteristics; Circuit simulation; Crystallization; Current-voltage characteristics; Glass; MOSFETs; Semiconductor device modeling; Semiconductor process modeling; Silicon; Thin film transistors; Voltage; CMOS; modeling; semiconductor modeling; silicon-on-insulator technology; thin-film transistors;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2009.2026111
  • Filename
    5200328