White-light emitting thin-film electroluminescent device using micromachined structure

Author

Lee, Yun-Hi ; Ju, Byeong-Kwon ; Song, Man-Ho ; Kim, Dong-Ho ; Hahn, Taek-Sang ; Oh, Myung-Hwan

Author_Institution

Div. of Electron. & Inf. Technol., Korea Inst. of Sci. & Technol., Seoul, South Korea

Volume

44

Issue

1

fYear

1997

fDate

1/1/1997 12:00:00 AM

Firstpage

39

Lastpage

44

Abstract

A white-light emitting electroluminescent (EL) device with newly developed ZnS:Pr, Ce, F phosphor layer was fabricated inside a micromachined well having four-sided Si mirrors, prepared by anisotropic wet etching of Si (100) wafer. Highly luminant EL was achieved using the Si micromirrors. Furthermore, the EL device utilizing the metallized mirrors incorporated into the glass substrates also exhibited enhanced brightness when compared to the conventional face-emitting EL device

Keywords

II-VI semiconductors; brightness; cerium; electroluminescent displays; etching; fluorine; micromachining; phosphors; praseodymium; zinc compounds; II-VI semiconductors; ZnS:Pr,Ce,F; anisotropic wet etching; brightness; micromachined structure; micromirrors; phosphor layer; thin-film electroluminescent device; white light emission; Anisotropic magnetoresistance; Electroluminescent devices; Glass; Metallization; Micromirrors; Mirrors; Phosphors; Substrates; Thin film devices; Wet etching;

fLanguage

English

Journal_Title

Electron Devices, IEEE Transactions on

Publisher

ieee

ISSN

0018-9383

Type

jour

DOI

10.1109/16.554789

Filename

554789