Title :
Thermionic emission model of electron gate current in submicron NMOSFETs
Author :
Hasnat, Khaled ; Yeap, Choh-Fei ; Jallepalli, S. ; Hareland, Scott A. ; Shih, W.K. ; Agostinelli, V.M., Jr. ; Tasch, Al F. ; Maziar, Christine M.
Author_Institution :
Microelectron. Res. Center, Texas Univ., Austin, TX, USA
fDate :
1/1/1997 12:00:00 AM
Abstract :
A thermionic emission model based on a non-Maxwellian electron energy distribution function for the electron gate current in NMOSFET´s is described. The model uses hydrodynamic equations to describe more correctly the electron transport and gate injection phenomena in submicron devices. A generalized analytical function is used to describe the high-energy tail of the electron energy distribution function. Coefficients of this generalized function are determined by comparing simulated gate currents with the experimental data. This model also includes the self-consistent calculation of the tunneling component of the gate current by using the WKB approximation, and by using a more accurate representation of the oxide barrier by including the image potential. Good agreement with gate currents over a wide range of bias conditions for three different technological sets of devices are demonstrated by using a single set of coefficients
Keywords :
MOSFET; WKB calculations; current distribution; semiconductor device models; tunnelling; WKB approximation; electron gate current; electron transport; gate injection phenomena; generalized analytical function; hydrodynamic equations; image potential; nonMaxwellian electron energy distribution function; oxide barrier; submicron NMOSFET; thermionic emission model; tunneling component; Distribution functions; EPROM; Electron emission; Hot carriers; MOSFET circuits; Microelectronics; Monitoring; Steady-state; Substrate hot electron injection; Thermionic emission;
Journal_Title :
Electron Devices, IEEE Transactions on