DocumentCode
1295522
Title
Low cross-axis sensitivity micro-gravity microelectromechanical system sandwich capacitance accelerometer
Author
Qifang Hu ; Chengchen Gao ; Yilong Hao ; Yangxi Zhang ; Gang Yang
Author_Institution
Nat. Key Lab. of Sci. & Technol. on Micro/Nano Fabrication, Peking Univ., Beijing, China
Volume
6
Issue
7
fYear
2011
fDate
7/1/2011 12:00:00 AM
Firstpage
510
Lastpage
514
Abstract
This Letter presents the design and implementation of a highly symmetric microelectromechanical system sandwich accelerometer using a double-device-layer silicon-on-insulator (D-SOI) wafer. The proof mass of though-wafer-thickness is suspended by eight L-shaped beams mirror-symmetrically. The suspension system provides flexible mechanical suspension without large chip area consumption. Therefore the accelerometer is immune from trade-off between sensing capacitance and structure flexibility. The sensing mode (first vibration mode) of the accelerometer is successfully decoupled from other variation modes that followed. Thereby, the accelerometer is insensitive to the lateral acceleration and the rotation disturbance. The symmetric beam-mass structure is fabricated from both sides of the D-SOI wafer symmetrically using a combination of anisotropic wet etching and dry etching process. The accelerometer has high opened-loop capacitance sensitivity of 55 pF/ 1 g. The closed-loop sensitivity is 1.096 v/g and the cross-axis sensitivity is 0.356 . The resolution of the accelerometer is 4.167 g/ Hz (0 200 Hz at 1 atm).
Keywords
accelerometers; capacitive sensors; etching; microsensors; silicon-on-insulator; suspensions (mechanical components); L-shaped beams mirror; anisotropic wet etching; capacitance accelerometer; double device layer silicon-on-insulator; dry etching process; flexible mechanical suspension; low cross axis sensitivity microgravity microelectromechanical system; sensing capacitance; sensing mode; structure flexibility; symmetric microelectromechanical system; though wafer thickness; vibration mode;
fLanguage
English
Journal_Title
Micro & Nano Letters, IET
Publisher
iet
ISSN
1750-0443
Type
jour
DOI
10.1049/mnl.2011.0137
Filename
5981654
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