• DocumentCode
    1296198
  • Title

    Intrinsic Gain in Self-Aligned Polysilicon Source-Gated Transistors

  • Author

    Sporea, Radu A. ; Trainor, Michael J. ; Young, Nigel D. ; Shannon, John M. ; Silva, S. Ravi P

  • Author_Institution
    Adv. Technol. Inst., Univ. of Surrey, Guildford, UK
  • Volume
    57
  • Issue
    10
  • fYear
    2010
  • Firstpage
    2434
  • Lastpage
    2439
  • Abstract
    Thin-film self-aligned source-gated transistors (SGTs) have been made in polysilicon. The very high output impedance of this type of transistor makes it suited to analog circuits. Intrinsic voltage gains of greater than 1000 have been measured at particular drain voltages. The drain voltage dependence of the gain is explained based on the device physics of the SGT and the fact that a pinchoff occurs at both the source and the drain. The results obtained from these devices, which are far from optimal, suggest that, with a proper design, the SGT is well suited to a wide range of analog applications.
  • Keywords
    elemental semiconductors; silicon; thin film transistors; Si; analog circuits; drain voltage dependence; intrinsic voltage gains; self-aligned polysilicon source-gated transistors; thin-film self-aligned source-gated transistors; Analog circuits; Degradation; FETs; Gain measurement; Glass; Impedance; Implants; Laser feedback; Logic gates; Passivation; Physics; Thin film transistors; Voltage; Intrinsic gain; Schottky barrier; TFT; polysilicon; source-gated transistor (SGT); voltage gain;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2010.2056151
  • Filename
    5549883