DocumentCode
1296422
Title
Local-Wetting-Induced Deformation of Rolled-Up Si/Si-Ge Nanomembranes: A Potential Route for Remote Chemical Sensing
Author
Yu, Minrui ; Huang, Minghuang ; Savage, Donald E. ; Lagally, Max G. ; Blick, Robert H.
Author_Institution
Dept. of Electr. & Comput. Eng., Univ. of Wisconsin, Madison, WI, USA
Volume
10
Issue
1
fYear
2011
Firstpage
21
Lastpage
25
Abstract
We fabricate curled 3-D objects from semiconductor nanomembranes consisting of single-crystal silicon, which is epitaxially grown on silicon-germanium-on-insulator substrates. The curling is caused by relaxing the strain induced by lattice mismatch between silicon (Si) and germanium (Ge). Depending on the lithographically patterned geometries and their orientation with respect to the crystallographic direction, different shapes of tubes can be realized. Particularly interesting are tubes that are not completely closed, or partially open, whose mechanical response is ultraelastic. We demonstrate that applying acetone on such tubes generates a surface stress imbalance between the Si and Si-Ge layers, resulting in detectable shape changes. This mechanism has potential applications in chemical sensing, where the deformable curled structures act as dynamic-aperture reflector antennas. Our simulation suggests the curvature changes induced in the presence of certain chemical, such as acetone, will lead to distinctive far-field radiation patterns in the terahertz (THz) range.
Keywords
elastic deformation; elasticity; elemental semiconductors; membranes; microwave materials; nanofabrication; nanolithography; nanomechanics; nanopatterning; nanotubes; semiconductor epitaxial layers; semiconductor growth; silicon; stress relaxation; surface phenomena; wetting; Si-SiGe-SiO2; SiGe-SiO2; SiO2; acetone; crystallographic orientation; curled 3D semiconductor nanomembranes; dynamic-aperture reflector antennas; far-field radiation patterns; lattice mismatch; lithographically patterned geometry; local-wetting-induced deformation; nanotubes; remote chemical sensing; rolled-up nanomembrane; silicon-germanium-on-insulator substrates; strain relaxation; surface stress; terahertz range; ultraelastic mechanical response; Capacitive sensors; Chemicals; Crystallography; Geometry; Germanium; Lattices; Shape; Silicon; Stress; Substrates; Electromagnetic radiation effects; frequency-selective surfaces; microsensors; reflector antennas;
fLanguage
English
Journal_Title
Nanotechnology, IEEE Transactions on
Publisher
ieee
ISSN
1536-125X
Type
jour
DOI
10.1109/TNANO.2010.2066986
Filename
5549918
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