DocumentCode
1297304
Title
Collected Charge Analysis for a New Transient Model by TCAD Simulation in 90 nm Technology
Author
Artola, Laurent ; Hubert, G. ; Duzellier, S. ; Bezerra, Francoise
Author_Institution
ONERA, Toulouse, France
Volume
57
Issue
4
fYear
2010
Firstpage
1869
Lastpage
1875
Abstract
TCAD simulations of a 90 nm CMOS bulk technology have been performed to investigate how technologies parameters impact on the collection charge leading to Single Event Effects. This work proposes an improved diffusion collection model.
Keywords
CMOS integrated circuits; circuit simulation; ion beam effects; technology CAD (electronics); CMOS bulk technology; TCAD simulation; collected charge analysis; diffusion collection model; new transient model; single event effects; Aerospace electronics; Analytical models; Charge carrier density; Discrete event simulation; Doping; Doping profiles; Junctions; Neutrons; Predictive models; Semiconductor device modeling; Semiconductor process modeling; Space technology; Substrates; Transient analysis; Charge collection; TCAD simulation; diffusion analytical model; heavy ion; single event effect;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.2010.2053944
Filename
5550362
Link To Document