DocumentCode :
1298229
Title :
Microwave power performance comparison between single and dual doped-channel design in AlGaAs/InGaAs HFETs
Author :
Feng-Tso Chien ; Shien-Chin Chiol ; Yi-Jen Chan
Author_Institution :
Dept. of Electr. Eng., Nat. Central Univ., Chung-Li, Taiwan
Volume :
21
Issue :
2
fYear :
2000
Firstpage :
60
Lastpage :
62
Abstract :
Single and dual doped-channel AlGaAs/InGaAs FETs (DCFETs) were fabricated, characterized, and compared with each other in terms of dc, rf, and power performance. The dual doped channel design provides a higher current density, and a better linear operation range over a wide gate bias range and frequency. A 1 μm-long gate dual-DCFET operated at 1.9 GHz demonstrates a power-added efficiency of 51.5%, a gain of 19 dB, and an output power density of 305 mW/mm at 2.5 V. This performance suggests that dual doped-channel design is more suitable for linear and high power microwave device applications.
Keywords :
III-V semiconductors; aluminium compounds; current density; doping profiles; gallium arsenide; indium compounds; microwave field effect transistors; microwave power transistors; power field effect transistors; 1 micron; 1.9 GHz; 19 dB; 2.5 V; 51.5 percent; AlGaAs-InGaAs; DCFETs; HFETs; current density; dual doped-channel design; gate bias range; linear operation; microwave power performance; output power density; power-added efficiency; single doped-channel design; Breakdown voltage; Current density; Fabrication; Gallium arsenide; HEMTs; Indium gallium arsenide; Low voltage; MODFETs; Microwave devices; Power generation;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/55.821667
Filename :
821667
Link To Document :
بازگشت