DocumentCode :
1299396
Title :
Measurement of high-field electron transport in silicon carbide
Author :
Khan, Imran A. ; Cooper, James A., Jr.
Author_Institution :
Sch. of Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN, USA
Volume :
47
Issue :
2
fYear :
2000
fDate :
2/1/2000 12:00:00 AM
Firstpage :
269
Lastpage :
273
Abstract :
We report recent measurements of the drift velocity of electrons parallel to the basal plane in 6H and 4H silicon carbide (SiC) as a function of applied electric field. The dependence of the low field mobility and saturated drift velocity on temperature are also reported. The saturated drift velocities at room temperature are approximately 1.9×107 cm/s in 6H-SiC and 2.2×107 cm/s in 4H-SiC
Keywords :
electron mobility; high field effects; silicon compounds; wide band gap semiconductors; 4H-SiC; 6H-SiC; SiC; high-field electron transport; low-field mobility; saturated drift velocity; silicon carbide; temperature dependence; Aluminum; Annealing; Argon; Electron mobility; Etching; Nitrogen; Ohmic contacts; Silicon carbide; Temperature; Velocity measurement;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.822266
Filename :
822266
Link To Document :
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