• DocumentCode
    1299921
  • Title

    High magnetoresistance in sputtered Permalloy thin films through growth on seed layers of (Ni0.81Fe0.19)1-xCrx

  • Author

    Lee, W.Y. ; Toney, M.F. ; Mauri, D.

  • Author_Institution
    Almaden Res. Center, San Jose, CA, USA
  • Volume
    36
  • Issue
    1
  • fYear
    2000
  • Firstpage
    381
  • Lastpage
    385
  • Abstract
    The use of thin (Ni0.81Fe0.19)1-xCrx seed layer for obtaining high anisotropic magnetoresistance in Permalloy (Ni0.81Fe0.19) films is reported. The process yields a high ΔR/R of for example, 3.2% for 120-Å-thick NiFe, without high-temperature deposition or annealing. X-ray diffraction shows that the NiFeCr seed layer causes the formation of large [111] textured grains in the Permalloy film, and that the interface between these two layers is quite smooth. These both increase the ΔR and reduce the resistance R in the film, which lead to the high ΔR/R. Also discussed is the enhanced ΔR/R and thermal stability trilayer magnetoresistive sensors using this NiFeCr instead of Ta as a spacer.
  • Keywords
    Permalloy; X-ray diffraction; ferromagnetic materials; magnetic thin films; magnetoresistance; sputtered coatings; (Ni0.81Fe0.19)1-xCrx seed layer; Ni0.81Fe0.19; Ni0.81Fe0.19 Permalloy thin film; Ni0.81Fe0.19Cr; X-ray diffraction; anisotropic magnetoresistance; grain texture; spacer; sputter deposition; thermal stability; trilayer magnetoresistive sensor; Anisotropic magnetoresistance; Annealing; Chromium; Enhanced magnetoresistance; Iron; Magnetic sensors; Sputtering; Thermal resistance; Thermal stability; X-ray diffraction;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.822551
  • Filename
    822551