DocumentCode :
1299921
Title :
High magnetoresistance in sputtered Permalloy thin films through growth on seed layers of (Ni0.81Fe0.19)1-xCrx
Author :
Lee, W.Y. ; Toney, M.F. ; Mauri, D.
Author_Institution :
Almaden Res. Center, San Jose, CA, USA
Volume :
36
Issue :
1
fYear :
2000
Firstpage :
381
Lastpage :
385
Abstract :
The use of thin (Ni0.81Fe0.19)1-xCrx seed layer for obtaining high anisotropic magnetoresistance in Permalloy (Ni0.81Fe0.19) films is reported. The process yields a high ΔR/R of for example, 3.2% for 120-Å-thick NiFe, without high-temperature deposition or annealing. X-ray diffraction shows that the NiFeCr seed layer causes the formation of large [111] textured grains in the Permalloy film, and that the interface between these two layers is quite smooth. These both increase the ΔR and reduce the resistance R in the film, which lead to the high ΔR/R. Also discussed is the enhanced ΔR/R and thermal stability trilayer magnetoresistive sensors using this NiFeCr instead of Ta as a spacer.
Keywords :
Permalloy; X-ray diffraction; ferromagnetic materials; magnetic thin films; magnetoresistance; sputtered coatings; (Ni0.81Fe0.19)1-xCrx seed layer; Ni0.81Fe0.19; Ni0.81Fe0.19 Permalloy thin film; Ni0.81Fe0.19Cr; X-ray diffraction; anisotropic magnetoresistance; grain texture; spacer; sputter deposition; thermal stability; trilayer magnetoresistive sensor; Anisotropic magnetoresistance; Annealing; Chromium; Enhanced magnetoresistance; Iron; Magnetic sensors; Sputtering; Thermal resistance; Thermal stability; X-ray diffraction;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.822551
Filename :
822551
Link To Document :
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